Plasma Cathode Electron Sources: Physics, Technology, Applications

An up–to–date review and summary of this important subfield of applied plasma physics. Concentrating equally on providing a physical understanding of the basic processes involved in plasma electron emission and on the design and applications of plasma cathode electron beam sources, this monograph is of interest to designers of electron sources as well as to scientists and engineers using electron beams in research and industry. It will also be of benefit to both undergraduate and postgraduate students involved in vacuum and plasma electronics, the generation of charged–particle beams, and their applications.

Spis treści:
Preface.
1 Low–Pressure Discharges for Plasma Electron Sources.
1.1 Hollow–Cathode Discharge.
1.2 Discharges in Crossed Electric and Magnetic Fields.
1.3 Arc Discharges.
1.3.1 Vacuum–Arc Discharge.
1.3.2 Constricted Low–Pressure Arc Discharge.
References.
2 Electron Emission from Plasma.
2.1 General Features of Electron Emission from Plasma.
2.1.1 Ion Extraction from Plasma.
2.1.2 Processes Associated with Electron Extraction from Plasma.
2.2 Control of Plasma Electron Emission Current.
2.2.1 Control of Steady–State Electron Current.
2.2.2 Control of Electron Emission in Pulsed Mode.
2.3 Emission Characteristics of the Plasma of a Constricted Arc Discharge with an Extended Anode Section.
2.4 Electron Emission from Plasma at Fore–Vacuum Pressures.
2.5 Special Features of Electron Emission from Nonstationary Plasma.
References.
3 Plasma Sources for Axially Symmetric Electron Beams.
3.1 Cylindrical Electron–Beam Sources Based on Hollow–Cathode Discharges.
3.2 Sources of Steady–State Focused Electron Beams.
3.3 Sources of Tubular Electron Beams.
References.
4 Generation of Large–Cross–Section Beams in Plasma–Cathode Systems.
4.1 Elect ron Sources with High Pulsed Energy Density.
4.2 Plasma Cathode Accelerators and Electron Sources with Microsecond Low–Pressure Arc Discharge.
4.3 Sub–Microsecond Pulsed Electron–Beam Sources.
4.4 Plasma–Cathode Large–Cross–Section Electron Sources Based on Hollow–Cathode Glow.
4.5 Pulsed Low–Energy Electron Sources.
4.6 Plasma–Cathode Electron Source for Ribbon Beam Production in the Fore–Vacuum Pressure Range.
4.6.1 Design of the Electron Source.
4.6.2 Characteristics of the Electron Source.
4.6.3 Parameters of the Plasma Sheet Generated by a Ribbon Electron Beam.
References.
5 Some Applications of Plasma–Cathode Electron Sources.
5.1 Electron–Beam Welding.
5.2 Electron–Beam Cladding of Wear–Resistant Materials.
5.3 Use of Low–Energy, High–Current Electron Beams for Surface Treatment.
5.4 Production of Carbon Coatings by Plasma Produced by a Ribbon Electron Beam at Fore–Vacuum Pressure.
References.
Conclusion.
Subject Index.

Nota biograficzna:
Efim Oks is head scientist of the Plasma Sources Department at the High Current Electronics Institute, Russian Academy of Sciences, Russia. His work focuses on the twin areas of plasma–cathode electron beam sources and vacuum arc ion beam sources and was awarded prestigiously. Professor Oks has established numerous collaborative scientific research programs with researchers in the United States and Europe. He thus has become a significant international plasma physicist, having authored numerous papers in international journals.

Okładka tylna:
An up–to–date review and summary of this important subfield of applied plasma physics. Concentrating equally on providing a physical understanding of the basic processes involved in plasma electron emission and on the design and applications of plasma cathode electron beam sources, this monograph is of interest to designers of electron sources as well as to scientists and engineers using electron beams in research and industry. It will also be of benefit to both undergraduate and postgraduate students involved in vacuum and plasma electronics, the generation of charged–particle beams, and their applications.