Advanced Plasma Technology

Plasma technology is a rapidly growing field of science and technology with a boom of industrial applications. Panel display technology, solar cell development as well as tissue engineering and prostheses are just a few examples of significance to physicists, chemists, biologists and engineers alike. Edited and compiled by scientists with a global reputation in plasma research, this monograph compiles contributions on the latest results in plasma technology.
From the Contents:
Basic Approaches to Plasma Production and Control
Plasma Sources and Reactor Configurations
Advanced Simulations for Industrial Plasma Applications
Modeling and Diagnostics of He Discharges for Treatment of
Polymers
Three–Dimensional Modeling of Thermal Plasmas for the Design
of Sources
Radiofrequency Plasma Sources for Semiconductor Processing
Advanced Plasma Diagnostics for Thin–Film Deposition
Plasma Processing of Polymers by a Low–Frequency Discharge
Fundamentals on Plasma Deposition of Fluorocarbon Films
Plasma CVD Processes for Thin Film Silicon Solar Cells
VHF Plasma Production for Solar Cells
Growth Control of Clusters in Reactive Plasmas
Micro– and Nanostructuring in Plasma Processes for Biomaterials
Chemical Immobilization of Biomolecules on Plasma–Modified
Substrates
In Vitro Methods to Assess the Biocompatibility of Plasma–Modified Surfaces
Cold Gas Plasma in Biology and Medicine
Mechanisms of Sterilization and Decontamination of Surfaces
Application of Atmospheric Pressure Glow Plasma
Hydrocarbon and Fluorocarbon Thin Film Deposition
Remark on Production of Atmospheric Pressure Non–thermal
Plasmas
Present Status and Future of Color Plasma Displays
Characteristics of PDP Plasmas
Recent Progress in Plasma Spray Processing
Electrohydraulic Discharge Direct Plasma Water Treatment
Processes
Development and Physics Issues of an Advanced Space Prop
Spis treści:
Basic Approaches to Plasma Production and Control
N. Sato
Plasma Sources and Reactor Configurations
P. Colpo
Simulations for Low–Temperature Plasma Applications
J. K. Lee
Modeling and diagnostics of He discharges for treatment of polymers
D. Mataras
3–D Modelling of Thermal Plasmas (RF and Transferred Arc) for the Design of Sources and Industrial Processes
E. Ghedini
RF Plasma Sources for Semiconductor processing
F. F. Chen
Advanced Plasma Diagnostics for Thin Film Deposition
R. Engeln
Plasma Processing of Polymers by a Low–Frequency Discharge with Asymmetrical Configuration of Electrodes
F. Arefi–Khonsari and M. Tatoulian
Fundamentals on plasma deposition of fluorocarbon films
A. Milella
Plasma CVD processes for thin film Si solar cells
A. Matsuda
VHF Plasma Production for Solar Cells
Y. Kawai
Growth Control of Clusters in Reactive Plasmas and Its Application to High–stability a–Si Film Deposition
Y. Watanabe
Micro– and Nano–Structuring in Plasma–Processes for Biomaterials: Micro– and Nano–Features as Powerful Tools to Address Selective Biological Responses
E. Sardella
Chemical Immobilization of Biomolecules on Plasma Modified Substrates for Biomedical Applications
L. C. Lopez
In Vitro Methods to Assess the Biocompatibility of Plasma Modified Surfaces
M. Nardulli
Cold gas plasma in biology and medicine
E. Stoffels
Mechanisms of Sterilization and Decontamination of Surfaces by Low Pressure Plasma
F. Rossi
Application to Atmospheric Pressure Glow Plasma
M. Kogoma
Hydrocarbon and fluorocarbon thin films deposition in atmospheric pressure glow dielectric barrier discharges
F. Fanelli
Remark on Production of Atmospheric Pressure Non–Thermal Plasmas for Modern Application
R. Itatani
Present status and Future of Color Plasma Display
T. Shinoda
Cha racteristics of PDP Plasmas
H. Ikegami
Recent progress in plasma spray processing
T. Yoshida
Electrohydraulic Discharge Direct Plasma Water Treatment Processes
J.–S. Chang
Development and Physics Issues of an Advanced Space Propulsion
M. Inutake

Nota biograficzna:
Professor Riccardo d′Agostino is director of the Department of Chemistry at the University of Bari, Italy. His research is focused on low pressure plasma processes and diagnostics for the modification of materials. During is career, he authored 180 scientific papers and edited four books and three international proceedings. His memberships include the managing committee of Plasma Science Technique Division of IUVSTA and, as chairman, the IUPAC Committee on "Plasma Chemistry" (1989–1991). He served as co–editor of the journal Plasmas and Polymers (until 2003) and chaired numerous international conferences.
Professor Pietro Favia is Associate Professor of Chemistry and Chemistry of Materials at the Department of Chemistry, University of Bari, Italy. During his career he focused on low pressure plasma processes, plasma diagnostics and surface characterization techniques. He authored about 100 papers, acted as editor of two books and served in many organizing and scientific committees of renowned international conferences on Plasma Chemistry.
Professors Favia and d′Agostino are the two editors in chief of the journal Plasma Processes and Polymers (PPP).
The co–editors, Professors Farzaneh Arefi–Konsari, Yoshinobu Kawai, Noriyoshi Sato, Hideo Ikegami, are also experienced plasma researchers. They are responsible for sub–areas within the monograph, on which they have concentrated in their respective careers.


Okładka tylna:
Plasma technology is a rapidly growing field of science and technology with a boom of industrial applications. Panel display technology, solar cell development as well as t issue engineering and prostheses are just a few examples of significance to physicists, chemists, biologists and engineers alike. Edited and compiled by scientists with a global reputation in plasma research, this monograph compiles contributions on the latest results in plasma technology.
From the Contents:
Basic Approaches to Plasma Production and Control
Plasma Sources and Reactor Configurations
Advanced Simulations for Industrial Plasma Applications
Modeling and Diagnostics of He Discharges for Treatment of
Polymers
Three–Dimensional Modeling of Thermal Plasmas for the Design
of Sources
Radiofrequency Plasma Sources for Semiconductor Processing
Advanced Plasma Diagnostics for Thin–Film Deposition
Plasma Processing of Polymers by a Low–Frequency Discharge
Fundamentals on Plasma Deposition of Fluorocarbon Films
Plasma CVD Processes for Thin Film Silicon Solar Cells
VHF Plasma Production for Solar Cells
Growth Control of Clusters in Reactive Plasmas
Micro– and Nanostructuring in Plasma Processes for Biomaterials
Chemical Immobilization of Biomolecules on Plasma–Modified
Substrates
In Vitro Methods to Assess the Biocompatibility of Plasma–Modified Surfaces
Cold Gas Plasma in Biology and Medicine
Mechanisms of Sterilization and Decontamination of Surfaces
Application of Atmospheric Pressure Glow Plasma
Hydrocarbon and Fluorocarbon Thin Film Deposition
Remark on Production of Atmospheric Pressure Non–thermal
Plasmas
Present Status and Future of Color Plasma Displays
Characteristics of PDP Plasmas
Recent Progress in Plasma Spray Processing
Electrohydraulic Discharge Direct Plasma Water Treatment
Processes
Development and Physics Issues of an Advanced Space Prop