Nanoscale Calibration Standards and Methods: Dimensional and Related Measurements in the Micro and Nanometer Range

The quantitative determination of the properties of micro– and nanostructures is essential in research and development. Here, peer–reviewed papers are presented with contributions for the NanoScale 2004 seminar at the Physikalisch–Technische Bundesanstalt (PTB), Braunschweig, Germany, in March 2004. Topics include problems of quantitative measurement as well as methods of calibration, correction and instrumentation. The seminar stimulates the exchange of information between users in science and industry and manufacturers of the relevant hard– and software.

Spis treści:
PART I: INSTRUMENTATION – OVERVIEW.
1. Metrological Scanning Probe Microscopes – Instruments for Dimensional Nanometrology (Hans–Ulrich Danzebrink, Frank Pohlenz, Gaoliang Dai, and Claudio Dal Savio).
2. Nanometrology at the IMGC (M. Bisi, E. Massa, A. Pasquini, G. B. Picotto, and M. Pisani).
3. Metrological Applications of X–ray Interferometry (Andrew Yacoot).
PART II: INSTRUMENTATION – LONG–RANGE SCANNING PROBE MICROSCOPE.
4. Advances in Traceable Nanometrology with the Nanopositioning and Nanomeasuring Machine (Eberhard Manske, Rostislav Mastylo, Tino Hausotte, Norbert Hofmann, and Gerd Jäger).
5. Coordinate Measurements in Microsystems by Using AFM–Probing: Problems and Solutions.
6. Metrological Large Range Scanning Force Microscope Applicable for Traceable Calibration of Surface Textures (Gaoliang Dai, Frank Pohlenz, Hans–Ulrich Danzebrink, Min Xu, Klaus Hasche, Günter Wilkening).
PART III: INSTRUMENTATION – DEVELOPMENT OF SPM and SENSORS.
7. Traceable Probing with an AFM (K. Dirscherl and K. R. Koops).
8. Scanning Probe Microscope Setup with Interferometric Drift Compensation (Andrzej Sikora, Dmitri V. Sokolov, and Hand U. Danzebrink).
9. DSP–Based Metrological Scanning Force Microscope with Direct Interfermetric Position Meas urement and Improved Measurement Speed (Gaoliang Dai, Frank Pohlenz, Hans–Ulrich Danzebrink, Klaus Hasche, and Günter Wilkening).
10. Combined Confocal and Scanning Probe Sensor for Nano–Coordinate Metrology (Dmitri V. Sokolov, Dmitri V. Kazantesev, James W. G. Tyrrell, Tamosz Hasek, and Hans U. Danzebrink).
11. Combined Shear Force–Tunneling Microscope with Interferometric Tip Oscillation Detection for Local Surface Investigation and Oxidation (Andrzej Sikora, Teodor Gotszalk, and Roman Szeloch).
12. Low Noise Piezoresistive Micro Force Sensor (L. Doering, E. Peiner, V. Nesterov, and U. Brand).
PART IV: CALIBRATION – OVERVIEW.
13. Towards a Guideline for SPM Calibration (T. Dziomba, L. Koenders, and G. Wilkening).
14. True Three–Dimensional Calibration of Closed Loop Scanning Probe Microscopes (J. Garnaes, A. Kühle, L. Nielsen, and F. Borsetto).
15. Height and Pitch at Nanoscale – How Traceable is Nanometrology? (L. Koenders and F. Meli).
16. The Behavior of Piezoelectric Actuators and the Effect on Step–Height Measurement with Scanning Force Microscopes (A. Grant, L. McDonnell, and E. M. Gil Romero).
17. An Approach to the Development of Tolerance Systems for Micro– and Nanotechnology (J. Schöbel and E. Westkämper).
PART V: CALIBRATION – STANDARDS FOR NANOMETROLOGY.
18. Standards for the Calibration of Instruments for Dimensional Nanometrology (L. Koenders, T. Dziomba, P. Thomsen–Schmidt, and G. Wilkening).
19. "Atomic Flat" Silicon Surface for the Calibration of Stylus Instruments (S. Gröger and M. Dietzsch).
20. Investigations of Nanoroughness Standards by Scanning Force Microscopes and Interference Microscope (R. Krüger,–Sehm, T. Dziomba, and G. Dai).
21. Testing the Lateral Resolution in the Nanometre Range with a New Type of Certified Reference Material (M. Senoner, Th. Wirth, W. Österle, I. Kaiande r, R. L. Sellin, and D. Bimberg).
PART VI: CALIBRATION – TIP SHAPE.
22. Reconstruction and Geometric Assessment of AFM Tips (Torsten Machleidt, Ralf Kästner, and Karl–Heinz Franke).
23. Comparison of Different Methods of SFM Tip Shape Determination for Various Characterisation Structures and Types of Tip (S. Czerkas, T. Dziomba, and H. Bosse).
PART VII: CALIBRATION – OPTICAL METHODS.
24. Double Tilt Imaging Method for Measuring Aperture Correction Factor (Yen–Liang Chen, Chao–Jung Chen, and Gwo–Sheng Peng).
25. How Statistical Noise Limits the Accuracy of Optical Interferometry for Nanometrology.
26. Uncertainty Analysis of the PTB Measuring Equipment for the Investigation of Laser Interferometers (G. Sparrer and A. Abou–Zeid).
PART VIII: APPLICATION – LATERAL STRUCTURES.
27. Lateral and Vertical Diameter Measurements on Polymer Particles with a Metrology AFM (F. Meli).
28. Pitch and CD Measurements at Anisotropically Etched Si Structures in an SEM (C. G. Grase, S. Czerkas, H. Bosse, Yu. A Novikov, and A. V. Rakov).
29. Analysis and Comparison of CD–SEM Edge Operators: A Contribution to Feature Width Metrology.
30. Measurement of High–Resolution Interferential Encoders Using the PTB Nanometer Comparator (J. Flügge, R. Koening, and H. Bosse).
PART IX: APPLICATION – SURFACE.
31. Experimental Characterization of Micromilled Surfaces by Large–Range AFM (P. Bariani, G. Bissacco, H. N. Hansen, and L. De Chiffre).
32. Investigation of the Surface Roughness Measurement of Mass Standards (C. Zerrouki, L. R. Pendrill J. M. Bennett, Y. Haidar, F. De Fornel, and P. Pinot).
33. Surface Analysis of Precision Weights for the Study of Commonly Occurring Contaminants (Ulf Jacobsson and Peter Sjövall).
34. Tip–Shape Effect on the Accuracy of Capacitance Determination by Scanning Capacitance Microscopes (Stefan L&# 224;nyi).
35. Atomic Force Microscope Tip Influence on the Fractal and Multi–Fractal Analyses of the Properties of Randomly Rough Surfaces (P. Klapetek I. Ohlìdal, and Bílek).
PART X: APPLICATION – MATERIAL PROPERTIES.
36. Atomic Force Microscope Indentation Measurement Software (David Shuman).
37. Nanodeformation Analysis Near Small Cracks by Means of NanoDAC Technique (J. Keller, D. Vogel, B. Michel).
38. PTB′s Precision Interferometer for High Accuracy Characterization of Thermal Expansion Properties of Low Expansion Materials (R. Schödel and A. Abou–Zeid).
Index.

Nota biograficzna:
Günter Wilkening received his Ph.D. in Solid State Physics from the Technical University of Braunschweig, Germany, in 1977. In 1978, he joined the National Metrology Institute (Physikalisch–Technische Bundesanstalt PTB), where he conducts research in the fields of force measurement and dimensional measurements in the micro– and nanometre range. Since 1988 he has been involved in Scanning Probe Microscopy and its use for quantitative measurements. In 1994, Professor Wilkening became head of the Nano– and Micrometrology Department. He is an active member of a number of national and international committees.
Ludger Koenders is head of the Film Thickness and Nanostructures Research Group at the National Metrology Institute (Technische Bundesanstalt PTB) in Braunschweig, Germany. He received his Diploma and his Ph.D. in Physics from the University of Duisburg. For his Ph.D. thesis he investigated the adsorption of hydrogen and oxygen on III–V semiconductor surfaces using surface analytical techniques (AES, EELS, UPS, XPS) and resonant Raman spectroscopy. He joined the National Metrology Institute in 1989 and has worked on investigations of tip–sample effects in STM, on the development metrological SPM and of transfer standards for SPM. He has