Plasma Processes and Polymers: 16th International Symposium on Plasma Chemistry Taormina, Italy June 22–27, 2003

This unique collection of refereed papers is based on the best contributions presented at the 16th International Symposium on Plasma Chemistry in Taormina, Italy (ISPC–16, June 2003). A high class reference of relevance to a large audience in the plasma community as well as in the area of its industrial applications.

Spis treści:
Preface.
List of Contributors.
Part I: Plasma Deposition of Thin Films.
1 Polymer Surface Modification with Monofunctional Groups of Different Type and Density (J. Friedrich, G. Khn, R. Mix).
2 RF–Plasma Deposition of SiOx and a–C:H as Barrier Coatings on Polymers (D. Hegemann, U. Schtz, C. Oehr).
3 Upscaling of Plasma Processes for Carboxyl Functionalization (V. Sciarratta, D. Hegemann, M. Mller, U. Vohrer, C. Oehr).
4 Deposition of Fluorocarbon Films on Al and SiO<sub>2</sub> Surfaces in High–Density Fluorocarbon Plasmas: Selectivity and Surface Wettability (A. Tserepi, P. Bayiati, E. Gogolides, K. Misiakos, Ch. Cardinaud).
5 Hot–wire Plasma Deposition of Doped DLC Films on Fluorocarbon Polymers for Biomedical Applications (V.N. Vasilets, A. Hirose, Q. Yang, A. Singh, R. Sammynaiken, Yu.M. Shulga, A.V. Kuznetsov, V.I. Sevastianov).
6 Properties of Silicon Nitride by Room–Temperature Inductively Coupled Plasma Deposition (H. Zhou, C. Sim, A. Glidle. C. Hodson, R. Kinsey, C. D. W. Wilkinson).
7 Structural Analysis of Diamond–like Carbon Films Deposited by RF (13.56 MHz) in a Methane Gas Plasma Atmosphere (M. Ouchabane, M. Aoucher, A. Sekkal, K. Henda and H. Lahmar).
8 Rate constant of HMDSO + O reaction in plasma afterglow (Vít Kudrle, Vojtěch Doležal, Antonín Tálský, Jan Janča).
9 Plasma–Enhanced Thin–Film Deposition On Polycarbonates (B. Ulejczyk, T. Opalinska, L. Karpinski, K. Schmidt–S zalowski).
10 Molecular Tailoring Coating on TiO2 Nanoparticle Surface by Plasma Polymerization (Jing Zhang, Feng Zhu, Changnian Shi, Li Sun, Ying Wang, Zhan Cheng, Ping Ji, Qinyu Yang, Ying Guo, Rongming Zhou, Hankun Xie, W. J. van Ooij, Jie Lian, Donglu Shi).
Part II: Plasma–Grafting of Functional Groups.
11 Introduction of Acidic Functional Groups onto the Surface of Activated Carbons by Atmospheric–Pressure Nonthermal Plasma (Satoshi Kodama and Hidetoshi Sekiguchi).
12 Treatment of Flexible Polyethylene with Low–pressure Plasma to Improve its Painting Properties (Asunción Martínez–García, Alejandra Segura–Domingo, Ana Sánchez–Reche, Santiago Gisbert–Soler).
13 Surface Modification of PVDF by Microwave Plasma Treatment for Electroless Metallization (Mihaela Pascu, Dominique Debarnot, S. Durand, Fabienne Poncin–Epaillard).
14 Different Performance of Ar, O<sub>2</sub> and CO<sub>2</sub> RF Plasmas in the Adhesion of Thermoplastic Rubber to Polyurethane Adhesive (Ana B. Ortiz–Magán, M. Mercedes Pastor–Blas, José Miguel Martín–Martínez).
15 Low–temperature Plasma Treatment of Dry Empress–Tree Seeds (N. Puač, Z.Lj. Petrović, S. Živković, Z. Giba, D. GrubišIć and A.R. Ðor&the’ević).
16 Ion–induced Chemical and Structural Modification of Polymer Surfaces (G. Suchaneck, M. Guenther, G. Gerlach, K. Sahre, K.–J. Eichhorn, B. Wolf, A. Deyneka, L. Jastrabik).
17 Plasma–Enhanced Fluorination of Nitrile Butadiene Elastomer: an XPS study (A. Tressaud, E. Durand, C. LabrugCre).
18 Plasma–Surface Modification of Styrene–Butadiene Elas tomers for Improved Adhesion (J. Tyczkowski, I. Krawczyk, B. Woz´niak).
19 PET Surface after Plasma or Laser Treatment: Study of the Chemical Modifications and Adhesive Properties (P. Laurens, S. Petit, P. Bertrand, F. Aréfi–Khonsari).
20 Plasma Pretreatments and Treatments on Polytetrafluoroethylene for Reducing the Hydrophobic Recovery (P. Favia, A. Milella, L. Iacobelli, R. d’Agostino).
21 Oxygen–plasma Modification of Polyhedral Oligomeric Silsesquioxane (POSS) containing Copolymers for Micro– and Nanofabrication (N. Vourdas, V. Bellas, E. Tegou, O. Brani, V. Constantoudis, P. Argitis, A. Tserepi and E. Gogolides, D. Eon, G. Cartry, C. Cardinaud).
Part III: Plasma and Life Science.
22 Radicals of Plasma Needle Detected with Fluorescent Probe (Ingrid E. Kieft, Joep J.B.N. van Berkel, Erik R. Kieft, Eva Stoffels).
23 RF–Plasma Treatment on the Inside of Small Functional Devices for Biomedical Application (C. Oehr, D. Hegemann, M. Mller, U. Vohrer, M. Storr).
24 Plasma Sterilisation: Mechanisms Overview and Influence of Discharge Parameters (Francois Rossi, Riccardo De Mitri, Sophie Bobin and Rosy Eloy).
25 Improvement of Low–pressure Microwave Plasma–assisted Amino Functionalization of Polymers (K. SchrEder, B. Finke, A. Ohl).
26 PE–CVD Modification of Medical–grade PVC to Inhibit Bacterial Adhesion: PEO–like and Nanocomposite Ag/PEO–like Coatings (D.J. Balazs, K. Triandafillu, E. Sardella, G. Iacoviello, P. Favia, R. d’Agostino, H. Harms, and H.J. Mathieu).
27 Plasma–aided Micropatterning of Polystyrene Substrates for Driving Cell Adhesion and Spreading (E. Sardella, R. Gristina, G.S. Senesi, R. d’Agostino, P. Favia).
28 Plasma–deposited Acrylic Acid Coatings on Flat and Nanostructured Substrates for Cell–Culture Experiments (L. Detomaso, R. Gristina, G.S. Senesi, L.C. Lopez, P. Favia, R. d’Agostino).29 The Model for Origin of Life Precursors Based on Exhaust Utilisation in the Electric Discharge (Marcela Morvová, Imrich Morva, František Hanic).
Part IV: Chemical Synthesis, Powders and Non–Equilibrium Effects.
30 Gliding–Discharge CF<sub>2</sub>Cl<sub>2</sub> and CHF<sub>2</sub>Cl Decomposition in Reducing Conditions (Teresa Opalińska, Anna Opalska, Krzysztof Schmidt–Szałowski).
31 The Oxidation of Streams for Diesel Fuels Formulations by Means of High–voltage Oxygen Plasmas (Pedro Patiño, Eugenio Farrera, and Aurora Mej3a).
32 Acetylene and Ethylene Carbon Blacks Production in Plasma Process (Tomasz Zieliński, Teresa Opalińska, Jacek Kijeński).
33 DCM Production in a Dusty–Plasma Trap (A. Ivanov, V. Mitin, A. Pal, A. Ryabinkin, A. Serov, E. Skryleva, A Starostin, V. Fortov, Yu. Shulga).
34 Dust Particles in the dc Glow–Discharge Plasma: Self–organization and Peculiarities of Behavior (V.E. Fortov, A.G. Khrapak, V.I. Molotkov, O.F. Petrov, M.Y. Poustylnik, V.M. Torchinsky).
35 Controlled Growth of Carbon Nanotubes Using Pulsed Glow–Barrier Discharge (Tomohiro Nozaki, Yoshihito Kimura, Ken Okazaki, Shigeru Kado).
36 Investigation of Excited Species in a Carbon Ablation Plume in Nitrogen Gas Environment (M.A. Bratescu, Y. Sakai, N. Sakura, D. Yamaoka, Y. Suda and H. Sugawara).
37 Optimization of a DC–RF Hybrid Plasma Flow System Using Statistical Analysis (Kohtaro Kawajiri, Kandasamy Ramachandran and Hideya Nishiyama).

Nota biograficzna:
The editors are leading scientists worldwide, well known from their publications, their work as editors as well as from conference organizations:
Dr. Riccardo d′Agostino, Professor, Director of the Department of Chemis try, University of Bari, Italy
Dr. Michael R. Wertheimer, Professor, NSERC Industrial Research Chair on Low Pressure Plasma Processing of Materials, Ecole Polytechnique, Montreal Canada
Dr. Christian Oehr, Head of Dept. Interfacial Engineering, Fraunhofer Institute for Interfacial Engineering and Biotechnology, Stuttgart, Germany
Dr. Pietro Favia, Associate Professor, Department of Chemistry, University of Bari

Okładka tylna:
This unique collection of refereed papers is based on the best contributions presented at the 16th International Symposium on Plasma Chemistry in Taormina, Italy (ISPC–16, June 2003). A high class reference of relevance to a large audience in the plasma community as well as in the area of its industrial applications.