Polymers and Light: Fundamentals and Technical Applications

The synthesis of novel polymeric materials and the employment of light in industrial processes have played a significant role in technological developments over the last century. Technical processes based on the interaction of light with polymers are becoming increasingly important for various applications, and for the invention of new materials, such as nonlinear optical materials, optical waveguides, and photoresists in the production of computer chips. Furthermore, certain polymeric materials can be employed for the generation of light.
This first book to focus on the important and topical effect of light on polymeric materials reflects the multidisciplinary nature of the topic, building a bridge between polymer chemistry and physics, photochemistry and photophysics, and materials science.
Since it is written by a single, experienced author, a consistent approach is maintained throughout. The first three sections are devoted to light–induced physical and chemical processes and light–induced synthesis of polymers, while the final section treats such miscellaneous technical developments as polymers in optical memories, photosensors and
Photocatalysis.
Advanced reading for polymer, physical and organic chemists, manufacturers of optoelectronic devices, chemical engineers, and materials scientists.

Introduction
LIGHT–INDUCED PHYSICAL PROCESSES IN POLYMERS
Absorption of Light and Subsequent Photophysical Processes
Photoconductivity
Electro–optic and Nonlinear Optical Phenomena
Photorefractivity
Photochromism
Technical Developments Related to Photophysical Processes in Polymers
LIGHT–INDUCED CHEMICAL PROCESSES IN POLYMERS
Photoreactions in Synthetic Polymers
Photoreactions in Biopolymers
Technical Developments Related to Photochemical Processes in Polymers
LIGHT–INDUCED SYNTHESIS OF POLYMERS
Photopolymerization
Technical Developments Related to Photopolymerization
MISCELLANEOUS TECHNICAL DEVELOPMENTS
Polymers in Optical Memories
Polymeric Photosensors
Polymeric Photocatalysis



After finishing his phD at Cologne University, Germany, Wolfram Schnabel was appointed Professor at the Technical University of Berlin. He spent one year at the Northwestern University, Evanston, Illinois and is to date researcher at the Hahn–Meitner–Institute in Berlin. He published well over 300 journal articles in macromolecular chemistry, photochemistry and radiation chemistry and is the authors of three books.