Thin Film Analysis by X–Ray Scattering

While X–ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high–tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications.
Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in–depth introduction to the field of thin film X–ray characterization in a clear and precise manner.

Spis treści:
Preface.
Symbols.
1 Principles of X–ray Diffraction.
1.1 The Basic Phenomenon.
1.2 The θ/2θ Scan.
1.3 Intensity of Bragg Ref lections.
1.4 Applications.
2 Identification of Chemical Phases.
2.1 Histogram–Based Techniques.
2.2 Linear Attenuation Coefficient μ.
2.3 Determination and Interpretation of the μt Product.
2.4 Analysis of Phase Mixtures.
2.5 Amorphous Thin Films.
2.6 Accurate Determination of Lattice Parameter.
2.7 Applications.
3 Line Profile Analysis.
3.1 Model Functions and Peak Parameters.
3.2 Instrumental Line Profile.
3.3 Deconvolution by Fourier Techniques.
3.4 Ref lection Broadening by Small Crystallite Size Only.
3.5 Concomitant Occurrence of Size and Strain Broadening.
3.6 Application s.
4 Grazing Incidence Configurations.
4.1 Grazing Incidence X–ray Diffraction (GIXRD).
4.2 Penetration Depth and Information Depth.
4.3 Depth–Dependent Properties.
4.4 Refractive Index for X–rays.
4.5 Total External Ref lection and Critical Angle.
4.6 X–ray Reflectivity (XRR).
4.7 Grazing Incidence Diffraction (GID).
4.8 Applications.
5 Texture and Preferred Orientation.
5.1 Texture Factors.
5.2 Pole Figures.
5.3 Measurement of Pole Figures.
5.4 Directions, Orientations and Inverse Pole Figures.
5.5 Fiber Textures or Layer Textures.
5.6 Biaxial and Fully General Textures.
5.7 Depth Dependence of Thin–Film Textures.
5.8 Applications.
6 Residual Stress Analysis (Mario Birkholz and Christoph Genzel).
6.1 Ceiiinnosssttuv.
6.2 Fundamental Equation of XSA.
6.3 Measurement of dΨDistributions.
6.4 Diffraction Elastic Constants (DECs) s<sub>1</sub> and 1/2s<sub>2</sub>.
6.5 Grain Interaction Models.
6.6 The Effect of Texture.
6.7 Classification of Stresses.
6.8 Effect of Residual Stress Gradients.
6.9 Detection of Residual Stress Gradients in Thin Films.
6.10 Applications.
7 High–Resolution X–ray Diffraction (Mario Birkholz and Paul F. Fewster).
7.1 Strain, Strain Relaxation and Composition in Epitaxial Layers.
7.2 High–Resolution Rocking Curves.
7.3 Mosaicity and Extinction.
7.4 Dynamical Theory of Ewald and Extensions.
7.5 High–Resolution Rocking Curves and Profiles from Layer Structures.
7.6 Reciprocal Space Mapping.
7.7 Diffuse Scattering.
7.8 Extensions to High–Resolution Diffraction.

Nota biograficzna:
Dr. Mario Birkholz was born 1958 in Hamburg, Germany. He studied physics at the Free University of Berlin and completed his diploma thesis on structural investigatio ns of biological membranes in 1986, and obtained his Ph.D. on the structure of stoichiometry deviations in iron–pyrite in 1990. Research positions at Hahn–Meitner–Institut Berlin, at Fraunhofer Institute for Thin Film and Surface Technology, Braunschweig, and at IHP Microelectronics, Frankfurt (Oder), followed.
He is involved in the development of thin film systems for applications in photovoltaics, sensor technology and as protective coatings. His main scientific interest is focused on the structure and morphology of thin films, their investigation by x–ray scattering techniques and the relation between structure and function.

Okładka tylna:
While X–ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high–tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications.
Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in–depth introduction to the field of thin film X–ray characterization in a clear and precise manner.