Handbook of Thin Film Deposition

The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes.  In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films.

A practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance and applicationsCovers core processes and applications in the semiconductor industry and new developments in the photovoltaic and optical thin film industriesThe new edition takes covers the transition taking place in the semiconductor world from Al/SiO2 to copper interconnects with low-k dielectricsWritten by acknowledged industry experts from key companies in the semiconductor industry including Intel and IBMForeword by Gordon E. Moore, co-founder of Intel and formulator of the renowned ‘Moore’s Law’ relating to the technology development cycle in the semiconductor industry

Foreword to the Third Edition

Scaling of Devices and Thermal Scaling

PVD - Special Topics

CVD New Developments

CVD Equipment

CMP Method and Practice

Process Technology for Copper Interconnects

Optical Thin Films

Thin Films in Photovoltaics

Thin Films in Memory Applications

Index