Autor: Martin, Peter M.
Wydawca: Elsevier
Dostępność: 3-6 tygodni
Cena: 1 108,80 zł
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ISBN13: |
9780815520313 |
Autor: |
Martin, Peter M. |
Oprawa: |
Hardback |
Rok Wydania: |
2009-12-01 |
Tematy: |
TGM |
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
* Explains in depth the many recent i
1. Deposition Technologies: An Overview 2. Plasmas in Deposition Processes 3. Surface Preparation for Film and Coating Deposition Processes 4. Evaporation: Processes, Bulk Microstructures and Mechanical Properties 5. Sputter Deposition Processes 6. Ion Plating 7. Chemical Vapor Deposition 8. Atomic Layer Deposition 9. Plasma-Enhanced Chemical Vapor Deposition of Functional Coatings 10. Unfiltered and Filtered Cathodic Arc Processes 11. Vacuum Polymer Deposition 12. Thin Film Nucleation, Growth, and Microstructural Evolution: An Atomic Scale View 13. Glancing Angle Deposition 14. Nanocomposite Coatings for Severe Applications 15. Non-Elemental Characterization of Films and Coatings 16. Characterization of Films and Coatings 17. Atmospheric Pressure Plasma Sources and Processing 18. Jet Vapor Deposition
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