Handbook of Chemical Vapor Deposition: Principles, Technology and Applications

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

Introduction and General Considerations
Fundamentals of Chemical Vapor Deposition
The Chemistry of CVD
Metallo-Organic CVD (MOCVD)
CVD Processes and Equipment
The CVD of Metals
The CVD of the Allotropes of Carbon
The CVD of Non-Metallic Elements
The CVD of Ceramic Materials: Carbides
The CVD of Ceramic Materials: Nitrides
The CVD of Ceramic Materials: Oxides
The CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and II-VI Compounds (Chalcogenides)
CVD in Electronic Applications: Semiconductors
CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers
CVD in Optoelectronic and Ferroelectric Applications
CVD in Optical Applications
CVD in Wear- and Corrosion-Resistant Applications
CVD in Cutting-Tool Applications
CVD in Fiber, Powder, and Monolithic Applications
Conversion Guide
Appendix: Alternative Processes for Thin-Film Deposition and Surface Modification