Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.

Introduction
The Blanket Tungsten Approach
The Selective Tungsten Approach
Blanket Versus Selective Tungsten
Tungsten as Interconnect Material
The Chemistry of CVD-W and Properties of Tungsten
The Deposition Equipment
Miscellaneous
Chemical Vapor Deposition of Tungsten Silicide
References
Author Index
Subject Index
Appendix: Unit Cells of W and WSi2