Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification and Synthesis

Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin film form, and the modification of the properties of thin films.

Perspective on Past, Present and Future Uses of Ion Beam Technology
Part I. Ion Beam Technology
Gridded Broad-beam Ion Sources
ECR Ion Sources
Hall Effect Ion Sources
Ionized Cluster Beam (ICB) Deposition and Epitaxy
Part II. Sputtering Phenomena
Quantitative Sputtering
Laser-induced Fluorescence as a Tool for the Study of Ion Beam Sputtering
Characterization of Atoms Desorbed from Surfaces by Ion Bombardment Using Multiphoton Ionization Detection
Part III. Film Modification and Synthesis
The Modification of Films by Ion Bombardment
Control of Film Properties by Ion-assisted Deposition Using Broad Beam Sources
Etching with Directed Beams
Film Growth Modification by Concurrent Ion Bombardment: Theory and Simulation
Interface Structure and Thin Film Adhesion
Modification of Thin Films by Off-normal Incidence Ion Bombardment
Ion Beam Interactions with Polymer Surfaces
Topography: Texturing Effects
Methods and Techniques of Ion Beam Processes
Ion-assisted Dielectric and Optical Coatings
Diamond and Diamond-like Thin Films by Ion Beam Techniques
Index