Ionizing Radiation Effects in MOS Devices and Circuits

The first comprehensive overview describing the effects of ionizing radiation on MOS devices, as well as how to design, fabricate, and test integrated circuits intended for use in a radiation environment. Also addresses process–induced radiation effects in the fabrication of high–density circuits. Reviews the history of radiation–hard technology, providing background information for those new to the field. Includes a comprehensive review of the literature and an annotated listing of research activities in radiation–hardness research.

Spis treści:
Historical Perspective (H. Hughes).
Electron–Hole Generation, Transport, and Trapping in SiO2 (F. McLean, et al.).
Radiation–Induced Interface Traps (P. Winokur).
Radiation Effects on MOS Devices and Circuits (P. Dressendorfer).
Radiation–Hardening Technology (P. Dressendorfer).
Process–Induced Radiation Effects (T. Ma).
Source Considerations and Testing Techniques (K. Kerris).
Transient–Ionization and Single–Event Phenomena (S. Kerns).
Index.