Physical Vapor Deposition of Thin Films

A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high–tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and engineers in this field with the information they need to tackle thin film processes in the real world. Presenting a cohesive, thoroughly developed treatment of both fundamental and applied topics, Physical Vapor Deposition of Thin Films incorporates many critical results from across the literature as it imparts a working knowledge of a variety of present–day techniques. Numerous worked examples, extensive references, and more than 100 illustrations and photographs accompany coverage of:
∗ Thermal evaporation, sputtering, and pulsed laser deposition techniques
∗ Key theories and phenomena, including the kinetic theory of gases, adsorption and condensation, high–vacuum pumping dynamics, and sputtering discharges
∗ Trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets
∗ Quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam

Spis treści:
Introduction to Physical Vapor Deposition.
The Kinetic Theory of Gases.
Adsorption and Condensation.
Principles of High Vacuum.
Evaporation Sources.
Principles of Sputtering Discharges.
Sputtering.
Film Deposition.
Index.

Nota biograficzna:
JOHN E. MAHAN, PhD, is Professor of Electrical Engineering at Colorado State University.

Okładka tylna:
A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufact uring in the high–tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and engineers in this field with the information they need to tackle thin film processes in the real world. Presenting a cohesive, thoroughly developed treatment of both fundamental and applied topics, Physical Vapor Deposition of Thin Films incorporates many critical results from across the literature as it imparts a working knowledge of a variety of present–day techniques. Numerous worked examples, extensive references, and more than 100 illustrations and photographs accompany coverage of:
∗ Thermal evaporation, sputtering, and pulsed laser deposition techniques
∗ Key theories and phenomena, including the kinetic theory of gases, adsorption and condensation, high–vacuum pumping dynamics, and sputtering discharges
∗ Trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets
∗ Quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam