Fundamentals of Semiconductor Fabrication

This concise introduction to semiconductor fabrication technologycovers everything professionals need to know, from crystal growthto integrated devices and circuits. Throughout, the authors addressboth theory and the practical aspects of each major fabricationstep, including crystal growth, silicon oxidation,photolithography, etching, diffusion, ion implantation, and thinfilm deposition. The book integrates Computer Modeling & Simulation toolsthroughout. Process simulation is used as a tool for what–if analysis anddiscussion. Comprehensive coverage of process sequences helps readersconnect individual steps into a cohesive whole.

Chapter 1. Introduction.

Chapter 2. Crystal Growth.

Chapter 3. Silicon Oxidation.

Chapter 4. Photolithography.

Chapter 5. Etching.

Chapter 6. Diffusion.

Chapter 7. Ion Implantation.

Chapter 8. Film Deposition.

Chapter 9. Process Integration.

Chapter 10. IC Manufacturing.

Chapter 11. Future Trends and Challenges.

Appendix A: List of Symbols.

Appendix B: International System of Units (SI Units).

Appendix C: Unit Prefixes.

Appendix D: Greek Alphabet.

Appendix E: Physical Constants.

Appendix F: Properties of Si and GaAs at 300 K.

Appendix G: Some Properties of the Error Function.

Appendix H: Basic Kinetic Theory of Gases.

Appendix I: SUPREM Commands.

Appendix J: Running PROLITH.

Appendix K. Percentage Points of the t Distribution.

Appendix L: Percentage Points of the F Distribution.

Index.

Gary S. May, Ph.D. is Executive Assistant to the President andMotorola Foundation Professor of Microelectronics in the School ofElectrical and Computer Engineering at the Georgia Institute ofTechnology. Dr. May was a national Science Foundation nationalYoung Investigator, Georgia Tech?s Outstanding Young Alumnus,received Georgia Tech?s Outstanding Service Award, and was named aGiant of Science by the Quality Education for Minorities network in2001. He was a member of the NSF Engineering Advisory Committee,served on and chaired the NSF Committee for Equal Opportunity inScience and Engineering, and was Editor–in–Chief for IEEETransactions of Semiconductor Manufacturing from 1997 to 2001.Dr. May currently serves as chair of the National Advisory Boardfor the National Society of Black Engineers.

Simon M. Sze, Ph.D. is UMC Chair Professor of NationalChiao Tung University, and President of the National Nano DeviceLaboratories. He has received the IEEE Ebers Award, the Sun Yet–senAward, the National Science and Technology Award, and the NationalChair Professor Award. He is a Life Fellow of IEEE, a member of theAcademia Sinica, the Chinese Academy of Engineering, and the USNational Academy of Engineering. He has authored or coauthored over150 technical papers, and has written, edited, and contributed to24 books. His book Physics of Semiconductor Devices (Wiley1969, 2nd Ed, 1981) is the most cited work incontemporary engineering and applied science publications (over12,000 citations from ISI Press).